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SUBARO
SUBSTRATE AND BARRIER LAYER OPTIMISATION FOR CVD-GROWN-THIN-FILM CRYSTALLYNE SILICON SOLAR CELLS
Informazioni Generali
- Coordinatore:
- IMEC INTERNUVERSITAIR MICRO-ELECTRONICA CENTRUM VZW (Belgio)
- Responsabile:
- PIROZZI LUISA - (CASACCIA)
- Ruolo ENEA:
- PARTNER
- Sito WEB:
- Sito WEB non disponibile
Programmi Europei
- Programma:
- Quinto Programma Quadro UE (1998-2002) -> ENERGIA (1998-2002) (RST - Progetto di RST)
Descrizione e Attività
Descrizione Generale
A consortium has been formed by partners stemming from research and industry in order to progress towards the development of a cost-effective thin-film crystalline Si technology based on thermally assisted CVD as the deposition technique for the active crystalline Si-layer. The project focuses on three well-defined substrate options: Si-ribbons, conductive ceramics based on infiltrated SiAlON and insulating ceramics based on SiAlON. After the midterm assessment, the most promising conductive, respectively a one-side contacted monolithic module process. The active layers for these devices will be grown in a specifically developed continuous high-throughput CVD-reactor.
Attività svolta da ENEA
N/D
Dati Finanziari (in euro)
Costo Eleggibile
Contributo
Durata del Progetto
Partner (2)
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