Banca Dati PROGETTI UE





 

DETTAGLI PROGETTO  MORE MOORE
(Num. IST-1-507754)


Num. Contratto:
 IST-1-507754

Coordinatore: ASML NETHERLANDS (Paesi Bassi)

Responsabile ENEA: FLORA FRANCESCO - NUC-PLAS-FIPI (FRASCATI)

Ruolo ENEA: CONTR

Sito Web: Sito WEB non disponibile

Programma Quadro: Sesto Programma Quadro UE (2002-2006)

Programma UE: IST (2002-2006) - Tecnologie della società dell'informazione

Area Tematica:

Tipo Progetto: IP - Progetto Integrato

Descrizione:

This research proposal is about Extreme Ultra Violet Lithography (EUVL), the next generation technology chosen by the electronics industry to manufacture integrated circuits in 2010 and beyond. It represents an opportunity to boost the intensive efforts made by industry to reach new standards in lithography and achieve European leadership in the highly competitive sector of electronics manufacturing technology and know-how. The Integrated Project more Moore will involve various large and small manufacturing companies and research institutes or universities, all highly specialised in the key domains of EUVL and at the vanguard of European lithography research and development. Under the co-ordination of a leading European manufacturer of chip making equipment, the consortium constitutes a unique platform to integrate expertise in key branches of lithography, and to produce breakthrough technological solutions. The project will develop, ahead of the ITRS international roadmap (described in the main report), semiconductor devices shrunk by an order of magnitude down to the 5-nm size. The essential elements of the "More Moore" integrated research project can be summarised as follows: - More Moore will build upon and complement the work done in EUVL under National and EUREKA programmes, especially MEDEA+; - The research will push the limits of lithography to enable and exceed the requirements for the 22 nm node; - As an Integrated Project, it will extend the RandD network in this domain by including all capable institutes, universities and SME's.


Attività svolta da ENEA:

N/D


Note:


Posizione:
 855

Codice Atto:
 09F60

Atto di approvazione ENEA:
 139/2004/FIS

Unità alla stipula:
 FIS

Costo eleggibile del Progetto: 43.622.000,00

Contributo al Progetto: 23.250.000,00


Costo eleggibile per ENEA: 374.000,00

Contributo ad ENEA: 187.000,00

Anno di stipula:
 2004

Durata in mesi:
 36

Data di inizio:
 01-01-2004

Data di scadenza:
 31-12-2006


Indice                               Costo Tot. Contr. UE
               
0 IMEC INTERNUVERSITAIR MICRO-ELECTRONICA CENTRUM VZW Istituti di ricerca Belgio
1 CEA - COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES Istituti di ricerca Francia
2 CNRS - FRENCH NATIONAL CENTRE FOR SCIENTIFIC RESEARCH Istituti di ricerca Francia
3 EPPRA SOCIETE PAR ACTIONS SIMPLIFIEE Istituti di ricerca Francia
4 IMAGINE OPTIC SA Altro Francia
5 SAGEM SA Istituti di ricerca Francia
6 XENOCS SOCIETE PAR ACTIONS SIMPLIFIEE Industrie Francia
7 ADVANCED MASK TECHNOLOGY CENTER GMBH & CO KG Industrie Germania
8 CARL ZEISS Industrie Germania
9 FHG FRAUNHOFER GESELLSCHAFT Istituti di ricerca Germania
10 FOCUS GMBH Altro Germania
11 PHILIPS EXTREME UV GMBH Industrie Germania
12 SIGMA-C GMBH SOFTWARE Industrie Germania
13 UNIV. BIELEFELD Università Germania
14 UNIV. JOHANNES GUTENBERG MAINZ Università Germania
15 XTREME TECHNOLOGIES GMBH Industrie Germania
16 NCSR DEMOKRITOS - NATIONAL CENTER FOR SCIENTIFIC RESEARCH DEMOKRITOS Istituti di ricerca Grecia
17 ELETTRA - SINCROTRONE TRIESTE Istituti di ricerca Italia
18 ENEA Istituti di ricerca Italia CONTR
19 ASML NETHERLANDS Industrie Paesi Bassi COORD
20 FOM FOUNDATION FOR FONDAMENTAL RESEARCH MATTER Istituti di ricerca Paesi Bassi
21 PHYSTEX EENMANSZAAK Industrie Paesi Bassi
22 TNO - NETHERLANDS ORGANISATION FOR APPLIED SCIENTIFIC RESEARCH Istituti di ricerca Paesi Bassi
23 UNIV. TECHN. DELFT Università Paesi Bassi
24 RUSSIAN ACADEMY OF SCIENCE Università Russia

 Argomento  Macro Key  Keyword
Industry and technology ELECTRONICS, MICROELECTRONICS ELECTRONICS, MICROELECTRONICS
INFORMATION PROCESSING, INFORMATION SYSTEMS INFORMATION PROCESSING, INFORMATION SYSTEMS
RTD Horizontal Topics INNOVATION, TECHNOLOGY TRANSFER INNOVATION, TECHNOLOGY TRANSFER
SCIENTIFIC RESEARCH SCIENTIFIC RESEARCH
Social and Economic Concerns ECONOMIC ASPECTS ECONOMIC ASPECTS
INFORMATION, MEDIA INFORMATION, MEDIA
SOCIAL ASPECTS SOCIAL ASPECTS

 Indice
Nanotechnology
Risk assessment